Production of high-density capacitively coupled plasma with RF multi-hollow cathode and/or high secondary electron emission for DLC film preparation
< 05/06/2009 - by ohtsu >
Plasma Process and Polymer, Volume 6 Issue S1 , pp. S458-S461 (2009)
DOI: PPAP200931001
| capacitively coupled plasma discharge • diamond-like carbon films • hollow cathode discharge • multi-hollow electrode • PE-CVD • Raman spectroscopy • secondary electron emission • thin films |
| Abstract |
The effects of a hollow cathode discharge and secondary electron emission from a radio-frequency-biased electrode on the growing rate of diamond-like carbon films were studied. The rate of deposition for amorphous hydrogenous carbon thin films of about 200 nm·min-1 was attained at a voltage of -700 V with radio-frequency plasma using CH4 gas. Because of its non-uniformity, the profile was improved by changing the hole arrangement. A radial roughness of the deposited films of about 35 nm, for a film thickness of about 1 µm, was obtained with the best arrangement.
